Advisory board FA
Programme Chair:
Antonino S. ARICO', CNR-ITAE, Italy
Members:
Radoslav ADZIC, Brookhaven National Laboratory, USA
Giulio ALBERTI, Università di Perugia, Italy
Vincenzo ANTONUCCI, CNR-ITAE, Italy
Sukhvinder BADWAL, CSIRO Energy Technology, Australia
Vincenzo BAGLIO, CNR-ITAE, Italy
Perla BALBUENA, Texas A&M University USA
Hyuk CHANG, Samsung Electronics, Korea
Chusheng CHEN, University of Science and Technology of China, China
Koichi EGUCHI, Kyoto University, Japan
Juergen FLEIG, Technical University of Vienna, Austria
Thomas F. FULLER, Georgia Institute of Technology, USA
Hubert A. GASTEIGER, Technical University of Muenchen, Germany
John T.S. IRVINE, University of St. Andrews, UK
San Ping JIANG, Curtin University, Australia
Deborah JONES, Université Montpellier II, France
Hasuck KIM, Daegu Gyeongbuk Inst.of Science & Technology, Korea
Philippe KNAUTH, Aix-Marseille Université - CNRS, France
Carina LAGERGREN, KTH Royal Institute of Technology, Sweden
Qingfeng LI, Technical University of Denmark, Denmark
Xianguo LI, University of Waterloo, Canada
Mogens B. MOGENSEN, Technical University of Denmark, Denmark
Sri R. NARAYAN, University of Southern California, USA
Vijay K. RAMANI, Illinois Institute of Technology, USA
Ilan RIESS, Technion - Israel Institute of Technology, Israel
Nigel M. SAMMES, POSTECH, Korea
Mauro SCAGLIOTTI, RSE SpA, Italy
Günther G. SCHERER, Paul Scherrer Institute, Switzerland
Pei Kang SHEN, Sun Yat-sen University, China
Subhash C. SINGHAL, Pacific Northwest National Lab., USA
Robert STEINBERGER-WILCKENS, University of Birmingham, UK
Panagiotis TSIAKARAS, University of Thessaly, Greece
Hiroyuki UCHIDA, University of Yamanashi, Japan
Sea-Fue WANG, National Taipei University of Technology, Taiwan
Masahiro WATANABE, University of Yamanashi, Japan
Zhaoyin WEN, Shanghai Institute of Ceramics, CAS, China
Harumi YOKOKAWA, AIST, Japan
Piotr ZELENAY, Los Alamos National Laboratory, USA
Tianshou ZHAO, Hong Kong University of Science & Technology, Hong Kong
Antonino S. ARICO', CNR-ITAE, Italy
Members:
Radoslav ADZIC, Brookhaven National Laboratory, USA
Giulio ALBERTI, Università di Perugia, Italy
Vincenzo ANTONUCCI, CNR-ITAE, Italy
Sukhvinder BADWAL, CSIRO Energy Technology, Australia
Vincenzo BAGLIO, CNR-ITAE, Italy
Perla BALBUENA, Texas A&M University USA
Hyuk CHANG, Samsung Electronics, Korea
Chusheng CHEN, University of Science and Technology of China, China
Koichi EGUCHI, Kyoto University, Japan
Juergen FLEIG, Technical University of Vienna, Austria
Thomas F. FULLER, Georgia Institute of Technology, USA
Hubert A. GASTEIGER, Technical University of Muenchen, Germany
John T.S. IRVINE, University of St. Andrews, UK
San Ping JIANG, Curtin University, Australia
Deborah JONES, Université Montpellier II, France
Hasuck KIM, Daegu Gyeongbuk Inst.of Science & Technology, Korea
Philippe KNAUTH, Aix-Marseille Université - CNRS, France
Carina LAGERGREN, KTH Royal Institute of Technology, Sweden
Qingfeng LI, Technical University of Denmark, Denmark
Xianguo LI, University of Waterloo, Canada
Mogens B. MOGENSEN, Technical University of Denmark, Denmark
Sri R. NARAYAN, University of Southern California, USA
Vijay K. RAMANI, Illinois Institute of Technology, USA
Ilan RIESS, Technion - Israel Institute of Technology, Israel
Nigel M. SAMMES, POSTECH, Korea
Mauro SCAGLIOTTI, RSE SpA, Italy
Günther G. SCHERER, Paul Scherrer Institute, Switzerland
Pei Kang SHEN, Sun Yat-sen University, China
Subhash C. SINGHAL, Pacific Northwest National Lab., USA
Robert STEINBERGER-WILCKENS, University of Birmingham, UK
Panagiotis TSIAKARAS, University of Thessaly, Greece
Hiroyuki UCHIDA, University of Yamanashi, Japan
Sea-Fue WANG, National Taipei University of Technology, Taiwan
Masahiro WATANABE, University of Yamanashi, Japan
Zhaoyin WEN, Shanghai Institute of Ceramics, CAS, China
Harumi YOKOKAWA, AIST, Japan
Piotr ZELENAY, Los Alamos National Laboratory, USA
Tianshou ZHAO, Hong Kong University of Science & Technology, Hong Kong
