FK - 5th International Conference
Novel Functional Carbon Nanomaterials
Co-Chairs:
Yury GOGOTSI, Drexel University, USA (Programme Chair)
Sumio IIJIMA, Meijo University, Japan
Jari KINARET, Chalmers University of Technology, Sweden
Robert NEMANICH, Arizona State University, USA
Members:
Alexander BALANDIN, University of California, Riverside, USA
Philippe BERGONZO, CEA, LIST Institute - DCSI, France
Laszlo P. BIRO, Inst.for Technical Physics & Matls Science, Hungary
Antonio H. CASTRO NETO, Boston University, USA
Li-Chyong CHEN, National Taiwan University, Taiwan
Ying (Ian) CHEN, Deakin University, Australia
Yongsheng CHEN, Nankai University, China
Hui-Ming CHENG, Shenyang National Lab.for Materials Science, IMR, China
Luigi COLOMBO, Texas Instruments Incorporated, USA
Morinobu ENDO, Shinshu University, Japan
Andrea C. FERRARI, University of Cambridge, UK
Jose Antonio GARRIDO, Technical University Muenchen, Germany
Etienne GHEERAERT, Institut Néel CNRS, France
Francisco GUINEA, CSIC - ICMM, Spain
Kenji HATA, AIST, Japan
Mark C. HERSAM, Northwestern University, USA
Karsten HORN, FHI Berlin, Germany
Jisoon IHM, Seoul National University, Korea
Richard JACKMAN, University College London, UK
Esko I. KAUPPINEN, Aalto University, Finland
Sang Ouk KIM, KAIST, Korea
Vitali I. KONOV, General Physics Institute of RAS, Russia
Alexander KROMKA, Institute of Physics of the ASCR, Czech Republic
Kian Ping LOH, National University of Singapore, Singapore
Richard MARTEL, University of Montreal, Canada
Daniel NEUMAIER, AMO GmbH, Germany
Taiichi OTSUJI, Tohoku University, Japan
Tomas PALACIOS, MIT, USA
Vincenzo PALERMO, ISOF-CNR, Italy
Tapani RYHÄNEN, Nokia, Finland
Riichiro SAITO, Tohoku University, Japan
Michael S. STRANO, MIT, USA
Yonhua TZENG, National Cheng Kung University, Taiwan
Alexander VUL, Ioffe Physical-Technical Institute, RAS, Russia
Andrew WEE, National University of Singapore, Singapore
Yury GOGOTSI, Drexel University, USA (Programme Chair)
Sumio IIJIMA, Meijo University, Japan
Jari KINARET, Chalmers University of Technology, Sweden
Robert NEMANICH, Arizona State University, USA
Members:
Alexander BALANDIN, University of California, Riverside, USA
Philippe BERGONZO, CEA, LIST Institute - DCSI, France
Laszlo P. BIRO, Inst.for Technical Physics & Matls Science, Hungary
Antonio H. CASTRO NETO, Boston University, USA
Li-Chyong CHEN, National Taiwan University, Taiwan
Ying (Ian) CHEN, Deakin University, Australia
Yongsheng CHEN, Nankai University, China
Hui-Ming CHENG, Shenyang National Lab.for Materials Science, IMR, China
Luigi COLOMBO, Texas Instruments Incorporated, USA
Morinobu ENDO, Shinshu University, Japan
Andrea C. FERRARI, University of Cambridge, UK
Jose Antonio GARRIDO, Technical University Muenchen, Germany
Etienne GHEERAERT, Institut Néel CNRS, France
Francisco GUINEA, CSIC - ICMM, Spain
Kenji HATA, AIST, Japan
Mark C. HERSAM, Northwestern University, USA
Karsten HORN, FHI Berlin, Germany
Jisoon IHM, Seoul National University, Korea
Richard JACKMAN, University College London, UK
Esko I. KAUPPINEN, Aalto University, Finland
Sang Ouk KIM, KAIST, Korea
Vitali I. KONOV, General Physics Institute of RAS, Russia
Alexander KROMKA, Institute of Physics of the ASCR, Czech Republic
Kian Ping LOH, National University of Singapore, Singapore
Richard MARTEL, University of Montreal, Canada
Daniel NEUMAIER, AMO GmbH, Germany
Taiichi OTSUJI, Tohoku University, Japan
Tomas PALACIOS, MIT, USA
Vincenzo PALERMO, ISOF-CNR, Italy
Tapani RYHÄNEN, Nokia, Finland
Riichiro SAITO, Tohoku University, Japan
Michael S. STRANO, MIT, USA
Yonhua TZENG, National Cheng Kung University, Taiwan
Alexander VUL, Ioffe Physical-Technical Institute, RAS, Russia
Andrew WEE, National University of Singapore, Singapore
Daniel ARAUJO, University of Cadix, Spain
Jean-Charles ARNAULT, CEA Saclay, France
Marina BAIDAKOVA, Ioffe Physical-Technical Institute, Russia
Alexander BALANDIN, University of California, Riverside, USA
Florian BANHART, University of Strasbourg, France
Philippe BERGONZO, CEA, LIST Institute - DCSI, France
Christophe BICHARA, CINaM, France
Cinzia CASIRAGHI, University of Manchester, UK
Luigi COLOMBO, Texas Instruments Incorporated, USA
Luis ECHEGOYEN, University of Texas, El Paso, USA
Bastian ETZOLD, University of Erlangen-Nuernberg, Germany
Xinliang FENG, Max Plank & Shanghai University, Germany/China
Etienne GHEERAERT, Institut Néel CNRS, France
Ken HAENEN, Hasselt University, Belgium
Kenji HATA, AIST, Japan
Mark C. HERSAM, Northwestern University, USA
Alexander HOLLEITNER, Technische Universität München, Germany
Hway Chuan KANG, National University of Singapore, Singapore
Stefan KASKEL,Technical University of Dresden, Germany
Sang Ouk KIM, KAIST, Korea
Arkady V. KRASHENINNIKOV, University of Helsinki, Finland
Wolfgang MERTIN, University Duisburg-Essen, Germany
Vadym N. MOCHALIN, Drexel University, USA
Robert NEMANICH, Arizona State University, USA
Volker PRESSER, INM-Leibniz Inst.for New Materials GmbH, Germany
Wencai REN, Institute of Metal Research, CAS, China
Bohuslav REZEK, Institute of Physics of the ASCR, Czech Rep.
Fedor SHAKHOV, Ioffe Physical-Technical Institute, Russia
E.F. SHEKA, Peoples' Friendship University of Russia, Russia
Kazu SUENAGA, AIST, Japan
Daisuke TAKEUCHI, AIST, Japan
Levente TAPASZTO, Inst.of Technical Physics and Materials Science, Hungary
Maria Letizia TERRANOVA,University of Rome "Tor Vergata", Italy
Oliver WILLIAMS, University of Cardiff, UK
Rositza YAKIMOVA, Linköping University, Sweden
Ting YU, Nanyang Technological University, Singapore
Jean-Charles ARNAULT, CEA Saclay, France
Marina BAIDAKOVA, Ioffe Physical-Technical Institute, Russia
Alexander BALANDIN, University of California, Riverside, USA
Florian BANHART, University of Strasbourg, France
Philippe BERGONZO, CEA, LIST Institute - DCSI, France
Christophe BICHARA, CINaM, France
Cinzia CASIRAGHI, University of Manchester, UK
Luigi COLOMBO, Texas Instruments Incorporated, USA
Luis ECHEGOYEN, University of Texas, El Paso, USA
Bastian ETZOLD, University of Erlangen-Nuernberg, Germany
Xinliang FENG, Max Plank & Shanghai University, Germany/China
Etienne GHEERAERT, Institut Néel CNRS, France
Ken HAENEN, Hasselt University, Belgium
Kenji HATA, AIST, Japan
Mark C. HERSAM, Northwestern University, USA
Alexander HOLLEITNER, Technische Universität München, Germany
Hway Chuan KANG, National University of Singapore, Singapore
Stefan KASKEL,Technical University of Dresden, Germany
Sang Ouk KIM, KAIST, Korea
Arkady V. KRASHENINNIKOV, University of Helsinki, Finland
Wolfgang MERTIN, University Duisburg-Essen, Germany
Vadym N. MOCHALIN, Drexel University, USA
Robert NEMANICH, Arizona State University, USA
Volker PRESSER, INM-Leibniz Inst.for New Materials GmbH, Germany
Wencai REN, Institute of Metal Research, CAS, China
Bohuslav REZEK, Institute of Physics of the ASCR, Czech Rep.
Fedor SHAKHOV, Ioffe Physical-Technical Institute, Russia
E.F. SHEKA, Peoples' Friendship University of Russia, Russia
Kazu SUENAGA, AIST, Japan
Daisuke TAKEUCHI, AIST, Japan
Levente TAPASZTO, Inst.of Technical Physics and Materials Science, Hungary
Maria Letizia TERRANOVA,University of Rome "Tor Vergata", Italy
Oliver WILLIAMS, University of Cardiff, UK
Rositza YAKIMOVA, Linköping University, Sweden
Ting YU, Nanyang Technological University, Singapore
The 5th International Conference "Novel Functional Carbon Nanomaterials" (which follows the conferences named "Diamond and Other New Carbon Materials" held in the frames of previous CIMTEC editions) will highlight recent achievements and challenges in the synthesis, structural control and modeling at the meso- and nano-scales of the variety of low-dimensional carbon allotropes including nanodiamonds, DLCs, buckyballs, nanotubes, graphene and graphene oxides which are credited with large opportunities and promises for a range of emerging or forecast applications in high-speed nanoelectronics, optoelectronics, quantum information processing, quantum computing, energy conversion and storage, biosensors, drug delivery, medical imaging, thermal management, catalysis, nano-lubrication, etc.
Major aspects related to new chemistry, science and technology of growth, functionalisation, characterisation, and electronic, optical, mechanical, thermal and biomedical applications will be approached. Of special interest will be the creation of multifunctional hierarchical architectures based on nanocarbons as building blocks and on integration technologies of carbon-based nanostructures with other inorganic or organic materials to realize micro/nanodevices encouraging novel viable approaches in interfacing materials science, engineering and biology.
Major aspects related to new chemistry, science and technology of growth, functionalisation, characterisation, and electronic, optical, mechanical, thermal and biomedical applications will be approached. Of special interest will be the creation of multifunctional hierarchical architectures based on nanocarbons as building blocks and on integration technologies of carbon-based nanostructures with other inorganic or organic materials to realize micro/nanodevices encouraging novel viable approaches in interfacing materials science, engineering and biology.
Session Topics
- Nanodiamond: synthesis, deagglomeration, purification, functionalisation
- DLC and nanodiamond coatings: CVD and epitaxy for large area growth, roll-to-roll processing and layer transfer techniques
- Hybrid and multilayer materials
- Top-down and bottom-up growth techniques for CNTs, graphene and other carbon-related nanostructures
- Assembly into hierarchical architectures and heterostructures
- Core-shelll structures and devices
- In-situ monitoring of growth
- Characterisation methods at single nanoparticle level
- Ion implantation, annealing, doping and surface processing
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Theory, modeling and simulation
FK-1.2 Graphene and related materials
FK-1.3 Carbon nanotubes and other new carbon nanomaterials
FK-2 Structural characterization
- Structure, texture and topography
- Surfaces and interfaces
- Solid state, electronic, vibrational structure
- Structural defect states and impurities
- sp2-sp3 bonding distributions
- Spectroscopic techniques (Raman, NEXAFS, etc.)
- Surface characterization (STM, AFM, NSOM, RAS, etc.)
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X-ray optics and detections
FK-2.2 Graphene and related materials
FK-2.3 Carbon nanotubes and other new carbon nanomaterials
FK-3 Properties
- Electron transport (bulk injection junction)
- Surface conductivity
- Electron emission (field, photo and electron stimulated)
- Superconductivity
- Doping and defects
- Non-linear optics, photonics and optoelectronics of carbon nanostructures
- Thermal and mechanical properties
- Graphene and carbon nanotube mechanics (fracture, tearing, exfoliation)
- Catalytic properties
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Biological activity
FK-3.2 Graphene and related materials
FK-3.3 Carbon nanotubes and other new carbon nanomaterials
FK-4 Applications
- Active and passive devices (field effect transistors, field emitters, displays, electron multipliers, radiation detectors, sensors, magnetic and electronic data storage)
- Nanoelectronics, spintronics, quantum information processing
- Energy and electrochemical applications: solid state lighting, solar cells, energy harvesting, fuel cells, batteries and supercapacitors, thermoelectrics, novel electrode materials, catalysis, and other
- Thermal and mechanical applications (heat sinks, heat spreaders, nanolubrificants, etc.)
- Saw devices
- MEMS/NEMS for mechanical, electrochemical, sensor etc.. devices
- Biosensors, gas sensors
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Biomedical applications: bio imaging, drug delivery, regenerative medicine
FK-4.2 Graphene and related materials
FK-4.3 Carbon nanotubes and other new carbon nanomaterials